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Photopolymers Photoresist Materials, Processes, and Applications by Kenichiro Nakamura

Автор: Bo0mB0om » 6 июля 2016
Photopolymers Photoresist Materials, Processes, and Applications by Kenichiro Nakamura
Kenichiro Nakamura, "Photopolymers: Photoresist Materials, Processes, and Applications"
English | ISBN: 146651728X | 2014 | 189 pages | PDF | 9 MB


Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more.
Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, Photopolymers: Photoresist Materials, Processes, and Applications covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the worlds largest corporations. Offering a state-of-the-art review of progress in the development of photopolymers, this book provides valuable insight into current and future opportunities for photopolymer use.

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